Method of and device for sub-micron processing a surface
作者： Evert Jan Van Loenen
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摘要: A method of and a device for sub-micron deforming surface (15) is described, example the purpose inscribing information. During scanning tip (14) tunneling microscrope held at constant distance from by means negative feedback control loop (18) which controlled current (It) between surface, forming pit (21) in (15). The deactivated height drive member (8) energized voltage (Vpz) whose amplitude increases as function time has predetermined final value, such that lowered into material.
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