An MILP-based wire spreading algorithm for PSM-aware layout modification

摘要: Phase shifting mask (PSM) is a promising resolution enhancement technique, which used in the deep sub-wavelength lithography of VLSI fabrication process. However, applying PSM technique requires layout to be free phase conflicts. In this paper, we present mixed integer linear programming (MILP) based modification algorithm solves conflict problem by wire spreading. Unlike existing methods first solve removing edges from layout-associated graphs and then try revise match resultant graphs, our simultaneously considers feasibility modifying layout. The experimental results indicate that without increasing chip size, can well tackled with minimal perturbation