X-ray diffraction and high resolution transmission electron microscopy characterization of intermetallics formed in Fe/Ti nanometer-scale multilayers during thermal annealing

摘要: Abstract Intermetallics formation in the Fe/Ti nanometer-scale multilayers magnetron-sputtering deposited on Si(100) substrate during thermal annealing at 623–873 K was investigated by using small and wide angle X-ray diffraction cross-sectional high-resolution transmission electron microscopy. The were constructed with bilayer thickness of 16.2 nm sublayer ratio 1:1. At temperature 623 K, intermetallics FeTi formed nucleation triple joins α-Fe(Ti)/α-Ti interface α-Ti grain boundary an orientational correlation FeTi(110)//α-Ti(100) FeTi[001]//α-Ti[001] to adjacent grains. lateral growth which is dependent diffusion path Ti led a coalescence into intermetallic layer. With increase temperature, Fe2Ti between excess Fe due limitation atomic concentrations, resulting coexistence Fe2Ti. It found that low energy as well dominant constrained interfacial reaction metallic multilayers.