Direct tests of microscopic growth models using hot scanning tunneling microscopy movies.

作者: Chris Pearson , Michael Krueger , Eric Ganz

DOI: 10.1103/PHYSREVLETT.76.2306

关键词:

摘要: We use a hot scanning tunneling microscope to make time lapse movies of the growth Si on Si(001) substrate. In initial stages molecular beam epitaxial at 530 K, many small one dimensional (1D) islands are formed. The explanation this curious shape anisotropy has been controversial. analyze acquired during deposition and follow changes in individual find that rate 1D is independent length, supporting model anisotropic sticking explain island anisotropy. ratio side sites versus end $0.019\ifmmode\pm\else\textpm\fi{}0.003$.

参考文章(22)
M.G. Lagally, R. Kariotis, B.S. Swartzentruber, Y.-W. Mo, Ordering kinetics at surfaces Ultramicroscopy. ,vol. 31, pp. 87- 98 ,(1989) , 10.1016/0304-3991(89)90038-7
Hiroshi Tokumoto, Masashi Iwatsuki, Scanning tunneling microscopy of clean silicon surfaces at elevated temperatures Japanese Journal of Applied Physics. ,vol. 32, pp. 1368- 1378 ,(1993) , 10.1143/JJAP.32.1368
Bert Voigtländer, André Zinner, Simultaneous molecular beam epitaxy growth and scanning tunneling microscopy imaging during Ge/Si epitaxy Applied Physics Letters. ,vol. 63, pp. 3055- 3057 ,(1993) , 10.1063/1.110256
D. J. Chadi, Stabilities of single-layer and bilayer steps on Si(001) surfaces. Physical Review Letters. ,vol. 59, pp. 1691- 1694 ,(1987) , 10.1103/PHYSREVLETT.59.1691
Y. W. Mo, J. Kleiner, M. B. Webb, M. G. Lagally, Activation energy for surface diffusion of Si on Si(001): A scanning-tunneling-microscopy study. Physical Review Letters. ,vol. 66, pp. 1998- 2001 ,(1991) , 10.1103/PHYSREVLETT.66.1998
Y.-W. Mo, J. Kleiner, M.B. Webb, M.G. Lagally, Surface self-diffusion of Si on Si(001) Surface Science. ,vol. 268, pp. 275- 295 ,(1992) , 10.1016/0039-6028(92)90968-C
G. Brocks, P. J. Kelly, R. Car, Binding and diffusion of a Si adatom on the Si(100) surface Physical Review Letters. ,vol. 66, pp. 1729- 1732 ,(1991) , 10.1103/PHYSREVLETT.66.1729
Deepak Srivastava, Barbara J. Garrison, The dynamics of surface rearrangements in Si adatom diffusion on the Si{100}(2 × 1) surface Journal of Chemical Physics. ,vol. 95, pp. 6885- 6891 ,(1991) , 10.1063/1.461500
Takehide Miyazaki, Hisashi Hiramoto, Makoto Okazaki, Ab initio study of elementary processes in silicon homoepitaxy : adsorption and diffusion on Si(001) Japanese Journal of Applied Physics. ,vol. 29, ,(1990) , 10.1143/JJAP.29.L1165