Rf sputtering method

摘要: A METHOD AND SYSTEM FOR RF SPUTTERING THIN CONDUCTING INSULATING FILMA ON SEMICONDUCTOR SUBSTRATE USING FIRST ELECTRODE SUPPORTING SOURCE MATERIAL AN APERTURED SECOND ELECTRODE. THE VOLTAGE IS APPLIED ACROSS ELECTRODES. SUPPORTED BY THIRD EXPOSED TO ATOMS SPUTTERED FROM WHICH PASS THROUGH MAY BE AT SAME POTENTIAL AS ELECTRODE, OR DIFFERENT CARRY OUT BIAS SPUTTERING. INCLUDES MULTIPLE PAIRS OF ELECTRODES FILM DEPOSITION WITHOUT BREADING VACUUM ROTATING MOVES SUBSTRATES PAST APERTURES IN DURING ELIMI- NATE SHADOWING FURTHER ENHANCE COOLING. SHUTTER PROVIDED PREVENT CROSSCONTAMINATION IDLE SOURCES BEING DEPOSITED SUBSTRATE.