Microwave plasma etching apparatus
作者： Shigeru Nishimatsu , Keizo Suzuki , Sadayuki Okudaira , Ichiro Kanomata
DOI:
关键词: Gas-filled tube 、 Optoelectronics 、 Analytical chemistry 、 Etching (microfabrication) 、 Microwave 、 Dielectric barrier discharge 、 Magnetic field 、 Chemistry 、 Stage (hydrology) 、 Ion source
摘要: A microwave plasma etching apparatus comprises: a discharge tube into which gas is supplied and forms region; means for generating magnetic field in the bringing stage holding material. In present invention, sample exists region. On one hand, an area of passage draining particles to outside from region 5/16 or less For this purpose, example, diameter 3/4 more
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