Apparatus for microwave processing in a magnetic field
作者： Masaya Kadono , Noriya Ishida , Kenji Itoh , Toru Takayama , Naoki Hirose
DOI:
关键词:
摘要: A microwave-assisted plasma processing apparatus has a reaction chamber in which substrate holder is provided to support be treated. The formed congruent with the inside of and located substantially separate space save for narrow clearance therebetween through exhausted gas passes from said into auxiliary space. By this structure, high density plasmas can without substantial loss input microwave energy.
lens.org参考文章(19)
Nobuo Fujiwara, Teruo Shibano, Kyusaku Nishioka, Toshiaki Ogawa, Hiroshi Morita, Kenji Kawai, Semiconductor wafer treating apparatus utilizing a plasma ,(1988)
Takashi Inujima, Toru Takayama, Naoki Hirose, Microwave plasma apparatus employing helmholtz coils and ioffe bars ,(1988)
Yoshinao Kawasaki, Katsuyoshi Kudo, Yutaka Kakehi, Hironobu Kawahara, Kado Hirobe, Plasma treating method and apparatus therefor ,(1988)
Masami Sasaki, Yasuhiro Suzuki, Sumio Mori, Eiji Fujiyama, Microwave plasma treatment apparatus ,(1989)
Toshimasa Kisa, Plasma processor and method for IC fabrication ,(1984)
Edith C. Rinehart, The American Heritage Dictionary of the English Language The Journal of Higher Education. ,vol. 41, pp. 246- 252 ,(1970) , 10.1080/00221546.1970.11773921
Shigeru Nishimatsu, Keizo Suzuki, Sadayuki Okudaira, Ichiro Kanomata, Microwave plasma etching apparatus ,(1980)
Susumu Aiuchi, Toru Otsubo, Teru Fujii, Minoru Noguchi, Takashi Kamimura, Plasma processing method and apparatus for carrying out the same ,(1984)
Sadayuki Okudaira, Ken Ninomiya, Ryoji Hamazaki, Shigeru Nishimatsu, Keizo Suzuki, Method for microwave plasma processing ,(1985)
Shuzo Fujimura, Toshimasa Kisa, Yasunari Motoki, Microwave plasma processing process and apparatus ,(1985)