Apparatus and method for determining wafer temperature using pyrometry
作者： Mehrdad M. Moslehi , Habib N. Najm , Lino A. Velo , Somnath Banerjee
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摘要: In a RTP reactor where wafer temperature is measured by pyrometer assembly (32), (50) further provided to measure the of quartz window (30) that situated between (32) and (16) being processed. During calibration procedure (100, 120) thermocouple used, measurements from are calibrated, collected compiled into tables. actual operation, data tables current used compute corrected temperature(s). The temperature(s) is/are then control intensities heating lamps according processing schedule.
lens.org 参考文章(6)
Soubei Suzuki, Junichi Nishizawa, Hitoshi Abe, Use of infrared radiation and an ellipsoidal reflection mirror ,(1985)
Mehrdad M. Moslehi, Habib N. Najm, Multi-point pyrometry with real-time surface emissivity compensation ,(1992)
Mehrdad M. Moslehi, Method and apparatus for precise temperature measurement ,(1992)
Thomas E. Thompson, Eugene R. Westerberg, Pyrometer apparatus and method ,(1991)
Andrew Kaldor, Paul Robinowitz, Alexander Stein, A laser radiometer ,(1982)