作者: J-M. Baribeau , N.L. Rowell , D.J. Lockwood
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摘要: We review recent advances in the growth of Si1−xGex islands and Ge dots on (001) Si. first discuss evolution island morphology with coverage effect parameters or post-growth annealing shape dots. outline some structural optical properties assess progress determination their composition strain distribution. Finally, we various approaches currently being investigated to engineer quantum particular control size, density, spatial For example, show how C pre-deposition Si can influence nucleation islands.