作者: J. A. Martin , M. Nastasi , J. R. Tesmer , C. J. Maggiore
DOI: 10.1063/1.99761
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摘要: A thin‐film technique for measuring the chemical composition of Y‐Ba‐Cu‐O thin films to a few percent accuracy is described. This utilizes non‐Rutherford backscattering 8.8 MeV helium ions, which has an increased sensitivity 16O by factor 25 over Rutherford spectrometry. The ratios cross sections He++ scattered from oxygen, copper, and yttrium relative barium are easily determined using standards that can be fabricated in any deposition system capable producing superconductors. does not require constant use or accurate charge determination.