Method of measuring surface form of semiconductor thin film
作者： Makoto Nakazawa
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摘要: The surface form of a semiconductor thin film such as polysilicon 13 formed on substrate 11 is measured through spectro-ellipsometry or by performing an IPA quantitative analysis GC. Mass (gas chromatography) after exposing the to (isopropyl alcohol) vapor and drying film. Through either these methods easily quickly measured.
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