Coating process using dense phase gas
作者： Orval F. Buck , David P. Jackson
DOI:
关键词:
摘要: A process for coating a substrate with chosen material comprising placing the in chamber and contacting mixture of selected dense phase gas at temperature pressure equal to or above critical period time which is sufficient allow complete penetration into all surfaces substrate. Then, shifted produce dissolution from thereby form on
lens.org 参考文章(10)
David P. Jackson, Dense phase gas photochemical process for substrate treatment ,(1989)
Anthony Kevin Dale Brown, Dial tone detector ,(1986)
Andiappan K. S. Murthy, Kundanbhai M. Patel, Alex Y. Bekker, Deposition of thin films using supercritical fluids ,(1985)
William H. Kasner, Roger L. Swensrud, Wei-Fang A. Su, Vincent A. Toth, Luciano C. Scala, Steve A. Wutzke, Daniel P. Soroka, Technique for the application and cure of photosensitive paints ,(1988)
Orval F. Buck, David P. Jackson, Cleaning process using phase shifting of dense phase gases ,(1989)
Brian N. Hansen, Robert E. Sievers, Chemical deposition methods using supercritical fluid solutions ,(1991)
Richard D. Smith, Supercritical fluid molecular spray film deposition and powder formation ,(1984)
Marc David Donohue, Chinsoo Lee, Kenneth Look Hoy, Supercritical fluids as diluents in liquid spray application of coatings ,(1987)
Winsel August Prof Dipl Phys D, Monomolecular or very thin coating prodn. on porous material - by contact with supercritical gas contg. solid or liq. coating material in soln. ,(1980)
Bion Patoritsuku, Jiyannpieeru Ruu, MEMBRANE FILTER FOR ULTRA OR MICRO FILTRATION OF LIQUID PARTICULARLY FOR WATER ,(1992)