作者: David Jackson
DOI:
关键词: Hydrofluoric acid 、 Supercritical fluid 、 Wet cleaning 、 Substrate (printing) 、 Phase (matter) 、 Chromatography 、 Materials science 、 Ammonium fluoride 、 Deposition (phase transition) 、 Thin film 、 Chemical engineering
摘要: The present invention is a method, process and apparatus for selective cleaning, drying, modifying substrate surfaces depositing thin films thereon using dense phase gas solvent admixtures within first created supercritical fluid antisolvent. Dense fluids are used in combination with sub-atmospheric, atmospheric super-atmospheric plasma adjuncts (cold thermal plasmas) to enhance surface modification, precision drying deposition processes herein. Moreover, conventional wet cleaning agents such as hydrofluoric acid ammonium fluoride may be the perform pre-treatments prior treatments described Finally, solid carbon dioxide argon follow-on treatment or plasmas further treat surface.