Precision surface treatments using dense fluids and a plasma

作者: David Jackson

DOI:

关键词: Hydrofluoric acidSupercritical fluidWet cleaningSubstrate (printing)Phase (matter)ChromatographyMaterials scienceAmmonium fluorideDeposition (phase transition)Thin filmChemical engineering

摘要: The present invention is a method, process and apparatus for selective cleaning, drying, modifying substrate surfaces depositing thin films thereon using dense phase gas solvent admixtures within first created supercritical fluid antisolvent. Dense fluids are used in combination with sub-atmospheric, atmospheric super-atmospheric plasma adjuncts (cold thermal plasmas) to enhance surface modification, precision drying deposition processes herein. Moreover, conventional wet cleaning agents such as hydrofluoric acid ammonium fluoride may be the perform pre-treatments prior treatments described Finally, solid carbon dioxide argon follow-on treatment or plasmas further treat surface.

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