作者: Salvatore Cusenza , Daniel Jürgens , Michael Uhrmacher , Peter Schaaf
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摘要: Stainless steel films were reactively magnetron sputtered in argon/nitrogen gas flow onto oxidized silicon wafers using austenitic AISI 316 stainless-steel targets. The deposited of about 300 nm thickness characterized by conversion electron Mo-i;ssbauer spectroscopy, magneto-optical Kerr-effect, X-ray diffraction, Rutherford backscattering spectrometry, and resonant nuclear reaction analysis. These complementary methods used for a detailed examination the nitriding effects films. formation an amorphous soft ferromagnetic phase wide range processing parameters was found. Further, influence postvacuum-annealing examined perturbed angular correlation to achieve comprehensive understanding process formation. is not very stable crystallization can be observed at 973 K.