Buckling and Delamination of Ti/Cu/Si Thin Film During Annealing

作者: Qijing Lin , Shuming Yang , Weixuan Jing , Changsheng Li , Chenying Wang

DOI: 10.1007/S11664-014-3238-7

关键词:

摘要: In this paper, the formation of buckling and delamination sandwiched stacking Ti/Cu/Si thin film are investigated. The crystallization structures, composition Cu/Ti films, surface morphology measured during annealing. results show that solid-phase reaction between Cu Ti occurs at interface. Buckling is initiated in annealed 600°C. volume expansion promotes further produces microcracks. With increasing expansion, there cavities formed middle layer when annealing temperature up to 700°C. Finally, delaminated from substrate.

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