QUANTUM CONFINEMENT EFFECTS ON THE OPTICAL PROPERTIES OF ION BEAM SPUTTERED NICKEL OXIDE THIN FILMS
作者： M. GHANASHYAM KRISHNA , A. K. BHATTACHARYA
DOI: 10.1142/S0217979201003740
关键词:
摘要: Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films are reported. Thin with crystallite sizes in range 9 to 14 nm have been deposited fused silica substrates. There is an increase band gap, from 3.4 3.9 eV, and a decrease refractive index, 2.4 1.6, size, that can be attributed quantum effects. The effective mass approximation has used explain observed behaviour gap variation.
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