System and method for cleaning of workpieces using supercritical carbon dioxide
作者： Robert W. Sherrill , Michael A. Fury
DOI:
关键词:
摘要: A supercritical CO2 cleaning system (100) according to the invention can include: a pressure chamber (135) configured clean workpiece with CO2; an expansion (140) receive output of (135); recycle (145) expanded stream from (140), and recycled stream; supply (105) fresh stream, purification (115) purified first co-solvent (125) where is stream.
lens.org 参考文章(11)
Robert Koch, Removal of polishing residue from substrate using supercritical fluid process ,(2001)
Larry R. Rosio, Charles W. Smith, Stephen H. Shore, Precision cleaning vessel ,(1994)
David P. Jackson, Dense fluid cleaning centrifugal phase shifting separation process and apparatus ,(2001)
Setsuyuki Takeuchi, Nobukuni Ibe, Biaxially stretched bottle having carrying handle ,(1998)
Wayne Martin Moreau, Donald J. Delehanty, Kenneth John McCullough, John P. Simons, Charles J. Taft, Richard P. Volant, John Michael Cotte, Process for removing chemical mechanical polishing residual slurry ,(2001)
Robert W. Conners, Jean-Luc Hubert, Richard A. Sauer, Pressure swing absorption based cleaning methods and systems ,(1996)
Timothy J. Romack, Joseph M. DeSimone, Douglas E. Betts, James B. McClain, Novel cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants ,(1996)
Michael A. Costantini, Heiko D. Moritz, Ijaz H. Jafri, David J. Mount, Rick M. Heathwaite, Mohan Chandra, Supercritical fluid delivery and recovery system for semiconductor wafer processing ,(2001)
Charles W. Smith, Thomas B. Stanford, Apparatus for applying ultrasonic energy in precision cleaning ,(1992)
Gerhard Dittrich, Method for providing measuring values and method for calculation of the costs for providing these values ,(2001)