Effect of deposition temperature on the microstructure and dielectric properties of Ba0.6Sr0.4TiO3 thin film deposited by radio‐frequency magnetron sputtering
作者： Zuyong Feng , Wei Chen , Ooi Kiang Tan
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摘要: Ba0.6Sr0.4TiO3 (BST) thin films with the thickness of 300 nm were deposited on Pt/SiO2/Si substrates at various deposition temperatures by RF magnetron sputtering technique, and their electric properties investigated. Due to high temperature annealing process substrate 600 °C, well-crystallized BST film was deposited. The dielectric constant loss °C are 0.033 100 kHz, respectively. good crystallinity sputtering, tunability up 39.2% is achieved a low applied voltage 5 V. (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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