Skin Response to Ultraviolet Radiation in Contact Photodermatitis Due to Fentichlor

摘要: There are several groups of chemicals that may produce contact photodermatitis and the action spectra for photopatch tests with these have been established. Controversy exists about UVR sensitivity in patients when performed on normal appearing skin without addition chemical. Four became "persistent light reactors" after developing from fentichlor, 3 using a hair cream containing chemical, 4th industrial exposure. Normal back trunk was tested to narrow waveband visible light, fentichlor not added during tests. Abnormal reactions UVB occurred all 4 showed UVA, 340 nm 1, 360 1 400 2. At pH absorbed between 310 325 nm, but at 9.2 absorption 275 350 there no above n.m. The results show true does exist reactors," is spurious. also sensitive UVA. Possible reasons discussed.