作者: Vitaly Gurylev , Mrinalini Mishra , Chung-Yi Su , Tsong-Pyng Perng
DOI: 10.1039/C5CC10610A
关键词:
摘要: A simple one-step and low-temperature process was developed to form an amorphous overlayer on the crystalline TiO2 film by atomic layer deposition. This composite structure is beneficial for improved photoelectrochemical efficiency since as-deposited showed unique properties such as local disorder presence of oxygen vacancies.