作者: Yong Son , Tae Woo Lim , Dong-Yol Yang , Prem Prabhakaran , Kwang-Sup Lee
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摘要: Fabrication of three-dimensional metallic microstructures is an important issue for various applications in electronics and nanophotonics. Precise micropatterns were fabricated by the two-photon induced photoreduction (TPPR) process. The process employs silver ions a metal ion solution composed nitrate (AgNO3) water-soluble polymer (poly(4-styrenesulfonique acid)). To improve resolution uniformity micropatterns, with high concentration was used, continuous forming window (CFW) fabrication conditions obtained considering mechanism TPPR heat effects during Through this work, lines minimum width 560 nm their quality verified.