PROPERTIES OF (Bi0.92Ce0.08)2Ti2O7 THIN FILMS PREPARED ON Si(100) BY CHEMICAL SOLUTION DECOMPOSITION

作者: Guanghui Xu , Xiangyang Jing , Yin Zhang , Baibiao Huang , None

DOI: 10.1142/S0218625X09013414

关键词:

摘要: (Bi0.92Ce0.08)2Ti2O7 thin films have been successfully prepared on P-type Si(100) substrates by a chemical solution decomposition method. The structural properties of the were studied X-ray diffraction. phase stability Bi2Ti2O7 was improved after Ce ions doped. dielectric constants annealed at 650° and 700°C higher than that without modification. 650°C showed highest permittivity. memory windows in C–V loops studied, indicating not ferroelectric films. All these results Ce-doped had potential for DRAM MOS applications.

参考文章(24)
C. H. Yang, G. D. Hu, Z. Wen, H. L. Yang, Effects of Bi2Ti2O7 buffer layer on memory properties of BiFe0.95Mn0.05O3 thin film Applied Physics Letters. ,vol. 93, pp. 172906- ,(2008) , 10.1063/1.3013564
XianMing Wu, Sh.W. Wang, H. Wang, Z. Wang, S.X. Shang, M. Wang, Preparation and characterization of Bi2Ti2O7 thin films by chemical solution deposition technique Thin Solid Films. ,vol. 370, pp. 30- 32 ,(2000) , 10.1016/S0040-6090(99)01100-1
M. Filipescu, N. Scarisoreanu, V. Craciun, B. Mitu, A. Purice, A. Moldovan, V. Ion, O. Toma, M. Dinescu, High-k dielectric oxides obtained by PLD as solution for gates dielectric in MOS devices Applied Surface Science. ,vol. 253, pp. 8184- 8191 ,(2007) , 10.1016/J.APSUSC.2007.02.166
G. D. Wilk, R. M. Wallace, J. M. Anthony, Hafnium and zirconium silicates for advanced gate dielectrics Journal of Applied Physics. ,vol. 87, pp. 484- 492 ,(2000) , 10.1063/1.371888
L.W. Fu, H. Wang, S.X. Shang, X.L. Wang, P.M. Xu, Preparation and characterization of Bi2Ti2O7 thin films grown by metalorganic chemical vapor deposition Journal of Crystal Growth. ,vol. 139, pp. 319- 322 ,(1994) , 10.1016/0022-0248(94)90181-3
X.N. Yang, B.B. Huang, H.B. Wang, S.X. Shang, W.F. Yao, J.Y. Wei, Effect of La doping on structural and electrical properties of Bi2Ti2O7thin films Journal of Crystal Growth. ,vol. 270, pp. 98- 101 ,(2004) , 10.1016/J.JCRYSGRO.2004.05.103
H. Wang, S. X. Shang, W. F. Yao, Y. Hou, X. H. Xu, D. Wang, M. Wang, J. Zh. Yu, Dielectric properties of Bi2Ti2O7 films grown on Si(100) substrate by APMOCVD Ferroelectrics. ,vol. 271, pp. 117- 123 ,(2002) , 10.1080/00150190211488
F.Y. Jiang, R.C. Liu, Main characteristics of Pb0.85Sm0.1TiO3 ferroelectric thin films with Bi2Ti2O7 buffer layer Journal of Crystal Growth. ,vol. 263, pp. 385- 388 ,(2004) , 10.1016/J.JCRYSGRO.2003.11.096
Ch.H. Yang, H.T. Wu, D.M. Yang, Effects of a Bi2Ti2O7 seeding layer on properties of Bi3.5Nd0.5Ti3O12 thin film Materials Letters. ,vol. 61, pp. 4166- 4168 ,(2007) , 10.1016/J.MATLET.2007.01.048