Potentiality of the photothermal surface-displacement technique for precisely performed absorption measurement of optical coatings

作者: P. Zimmermann , D. Ristau , E. Welsch

DOI: 10.1007/BF00323613

关键词:

摘要: The influence of sample properties on the measured signal has to be investigated, so that measurements optical absorption in thin-film coatings by means photothermal surface-displacement technique may precisely performed. Carrying out simultaneously metal at λ=10.6 μm using laser calorimetry as well technique, aforementioned and validity assumptions theoretical model, respectively, can proven. It demonstrated that, contrast thermophysical coating contribute probed surface displacement

参考文章(15)
L. D. Favro, M. Munidasa, Single Beam Interferometry of a Thermal Bump: II --Theory Review of Progress in Quantitative Nondestructive Evaluation. pp. 635- 640 ,(1989) , 10.1007/978-1-4613-0817-1_80
E. Welsch, H. G. Walther, P. Eckardt, Ton Lan, Low-absorption measurement of optical thin films using the photothermal surface-deformation technique Canadian Journal of Physics. ,vol. 66, pp. 638- 644 ,(1988) , 10.1139/P88-106
M. A. Olmstead, N. M. Amer, S. Kohn, D. Fournier, A. C. Boccara, Photothermal displacement spectroscopy: An optical probe for solids and surfaces Applied Physics A. ,vol. 32, pp. 141- 154 ,(1983) , 10.1007/BF00616610
Eberhard Welsch, Heinz‐Guenter Walther, Kerstin Friedrich, Peter Eckardt, Separation of optical thin‐film and substrate absorption by means of photothermal surface deformation technique Journal of Applied Physics. ,vol. 67, pp. 6575- 6578 ,(1990) , 10.1063/1.345140
Jon Opsal, Allan Rosencwaig, Thermal and plasma wave depth profiling in silicon Applied Physics Letters. ,vol. 47, pp. 498- 500 ,(1985) , 10.1063/1.96105
E. T. Swartz, R. O. Pohl, Thermal resistance at interfaces Applied Physics Letters. ,vol. 51, pp. 2200- 2202 ,(1987) , 10.1063/1.98939
Detlev Ristau, Johannes Ebert, Development of a thermographic laser calorimeter Applied Optics. ,vol. 25, pp. 4571- 4578 ,(1986) , 10.1364/AO.25.004571
H.G. Walther, E. Welsch, J. Opfermann, Calculation and measurement of the absorption in multilayer films by means of photoacoustics Thin Solid Films. ,vol. 142, pp. 27- 35 ,(1986) , 10.1016/0040-6090(86)90300-7
A. C. Boccara, Warren Jackson, Nabil M. Amer, D. Fournier, Sensitive photothermal deflection technique for measuring absorption in optically thin media Optics Letters. ,vol. 5, pp. 51- 51 ,(1980) , 10.1364/OL.5.000377