Surface depth analysis for fluorinated block copolymer films by X-ray photoelectron spectroscopy using C60 cluster ion beam
作者： Keiji Tanaka , Noriaki Sanada , Masaya Hikita , Tetsuya Nakamura , Tisato Kajiyama
DOI: 10.1016/J.APSUSC.2008.02.089
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摘要: Abstract X-ray photoelectron spectroscopy (XPS) using fullerene (C60) cluster ion bombardment was applied to films of a fluorinated block copolymer. Spectra so obtained were essentially different from those Ar beam. Structure in the surface region with depth down 60 nm drawn on basis XPS C60 beam same as one by result dynamic secondary mass spectrometry, which is well-established method for analysis polymers. This implies that enables gain access structure polymer range over analytical conventional XPS, is, three times inelastic mean-free path photoelectrons.
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