Shave-Off Depth Profiling for Nano-Devices
作者： Masashi Nojima , Masayuki Toi , Ayaka Maekawa , Takeshi Yamamoto , Tetsuo Sakamoto
DOI: 10.1007/S00604-006-0546-5
关键词:
摘要: Shave-off depth profiling completely differs from ultra shallow and has an absolute scale a 50 µm wide dynamic range. In this paper we report on shave-off of nano-device with complex nano-structure consisting random access memory introduces analytical tool for advancing nano-devices.
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sci-hub.se 参考文章(4)
A. Maekawa, M. Toi, T. Yamamoto, The Shave-off Depth Profiling by the Nano-Beam SIMS Journal of Surface Analysis. ,vol. 12, pp. 170- 173 ,(2005)
M. Nojima, M. Toi, A. Maekawa, B. Tomiyasu, T. Sakamoto, M. Owari, Y. Nihei, Nano-dimensional analysis for practical materials using the nano-beam SIMS apparatus E-journal of Surface Science and Nanotechnology. ,vol. 2, pp. 131- 135 ,(2004) , 10.1380/EJSSNT.2004.131
H. Satoh, Quantitative analysis by submicron secondary ion mass spectrometry Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 6, pp. 915- 918 ,(1988) , 10.1116/1.584322
M. Nojima, M. Toi, A. Maekawa, B. Tomiyasu, T. Sakamoto, M. Owari, Y. Nihei, Evaluation of the nano-beam SIMS apparatus Applied Surface Science. ,vol. 231, pp. 930- 935 ,(2004) , 10.1016/J.APSUSC.2004.03.176