Assembly for feeding in HF current for tubular cathodes

作者: Olaf Gawer , Sascha Kreher

DOI:

关键词:

摘要: The invention relates to an assembly for feeding in HF current rotatable tubular cathodes (1) a vacuum chamber (4) of plasma coating system, and high-frequency source (14) magnet (7) located within the cathode extending along producing magnetic field (6). aim is create that enables low-loss feed-in such manner especially homogeneous sputter removal from guaranteed. Said achieved coupled by means capacitive (9) form coupling capacitor (18). (18) comprises part surface metal plate or film (10), which surrounds at least partially specified distance.

参考文章(11)
Joachim Szczyrbowski, Klaus Hartig, Sputtering apparatus with a rotating target ,(1991)
Claes Bjorkman, Bryan Y. Pu, Kenny Doan, Hongching Shan, Richard Raymond Mett, Mike Welch, Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply ,(2001)
Fernando Anaya Chavez, Charles Frederick Brucker, Rajiv Yadav Ranjan, Qixu Chen, Sputtering target and method for making composite soft magnetic films ,(2002)
John R. German, Daniel T. Crowley, Roger L. Peterson, Brian P. Meinke, Alternating current rotatable sputter cathode ,(2004)
Chao Liu, Aiguo Patrick Hu, Nirmal-Kumar C. Nair, Coupling study of a rotary Capacitive Power Transfer system international conference on industrial technology. pp. 1- 6 ,(2009) , 10.1109/ICIT.2009.4939623
Daniel Colin Ludois, Justin Kyle Reed, Kyle Hanson, Wound field rotating machine with capacitive power transfer ,(2012)
Jeffrey Birkmeyer, Yoshikazu Hishinuma, Takamichi Fujii, Takayuki Naono, Youming Li, Physical vapor deposition with impedance matching network ,(2009)
Mark A. Bernick, Richard Newcomb, Magnetron for cylindrical targets ,(2007)