作者: Olaf Gawer , Sascha Kreher
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摘要: The invention relates to an assembly for feeding in HF current rotatable tubular cathodes (1) a vacuum chamber (4) of plasma coating system, and high-frequency source (14) magnet (7) located within the cathode extending along producing magnetic field (6). aim is create that enables low-loss feed-in such manner especially homogeneous sputter removal from guaranteed. Said achieved coupled by means capacitive (9) form coupling capacitor (18). (18) comprises part surface metal plate or film (10), which surrounds at least partially specified distance.