Method for manufacturing optical device
作者： Kazuhisa Takagi
DOI:
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摘要: A diffraction grating pattern is formed in the first insulating film on active layer by electron beam lithography, and at same time an end facet formation whose portion corresponds to a position of emission optical modulator absorption lithography. second pattern. The etched using films as masks form grating, embedded with layer. removed. third not cover facet.
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