A universal mask management relational database

作者: Philippe Morey-Chaisemartin

DOI: 10.1117/12.828953

关键词:

摘要: With the emergence of submicron technologies new product development costs have soared to reach an average $15M. This includes all direct and indirect from specification start volume production. At 65nm a single mask set more than $1M. As statistically final silicon needs at least one rework on metal layers, we can roughly estimate that budget is 10% chip development. It then obvious IDM companies as well fabless design centers must take special care for management. Improving data exchange between preparation teams shops by using SEMI-P10 standard has been great step, but building internal database warrant safe traceability masks still remains challenge. paper describes relational database, which manages related during entire life project. not only dedicated ordering, it also feedbacks manufacturing shop production line making possible.

参考文章(2)
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