Roughness of amorphous, polycrystalline and hemispherical-grained silicon films
作者： A. V. Novak , V. R. Novak
DOI: 10.1134/S106378501310009X
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摘要: We have performed atomic-force-microscopy studies of the roughness and spatial correlation properties surface for three typical LPCVD films silicon: amorphous polycrystalline with a relatively smooth surface, as well hemispherical grains (HSG-Si) having considerable roughness. As follows from analysis function power spectral density function, model self-affine is suitable describing morphology silicon films, while mounded preferable HSG-Si films.
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