METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

作者: Takehara Keiichirou

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摘要: A semiconductor manufacturing apparatus includes a chamber, gas supplier, vacuum pump, an electrode, conductive knitted wire mesh and radio frequency power supply. The electrode is placed outside of the chamber fixed to chamber. supplier supplies into pump exhausts supply through mesh.

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Obuchi Kazuto, Matsushita Atsushi, Hori Hisashi, Sakamoto Kaoru, PLASMA PROCESSING DEVICE ,(1998)
Matsushita Atsushi, Omori Shinichi, Minato Mitsuaki, Kanamori Jun, Plasma processing apparatus ,(1998)