Cross‐sectional specimens for transmission electron microscopy

作者: M. S. Abrahams , C. J. Buiocchi

DOI: 10.1063/1.1663778

关键词:

摘要: Cross‐sectional views of epitaxial structures yield much information when examined by transmission electron microscopy. Since the growth direction then lies in plane observation, rather than normal to it (as is usual), overgrowth, original interface, and substrate can be imaged either simultaneously or individually. A realization suitable technique for preparing thin cross‐sectional samples described. Applications continuously graded GaAs x P1−x /GaAs step‐graded In Ga1−x P/GaP are shown.

参考文章(3)
M. S. Abrahams, L. R. Weisberg, C. J. Buiocchi, J. Blanc, Dislocation morphology in graded heterojunctions: GaAs1−xPx Journal of Materials Science. ,vol. 4, pp. 223- 235 ,(1969) , 10.1007/BF00549922
M. V. Sullivan, G. A. Kolb, The Chemical Polishing of Gallium Arsenide in Bromine-Methanol Journal of The Electrochemical Society. ,vol. 110, pp. 585- 587 ,(1963) , 10.1149/1.2425820
M. S. Abrahams, C. J. Buiocchi, M. D. Coutts, Improvements to the ALBA machine for thinning specimens for electron microscopy. Review of Scientific Instruments. ,vol. 39, pp. 1944- 1945 ,(1968) , 10.1063/1.1683278