Metal line layout based on line shifting
作者： Matthias U. Lehr , Moritz Andreas Meyer , Rakesh Kumar Kuncha , Thomas Herrmann , Jens Hassmann
DOI:
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摘要: A method of Back-End-Of-Line processing a semiconductor device is provided including providing layout for metal lines metallization layer the device, determining semi-isolated line in and shifting at least portion determined line.
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