IC layout adjustment method and tool for improving dielectric reliability at interconnects

作者: Andrew B. Kahng , Tuck Boon Chan

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摘要: Method for adjusting a layout used in making an integrated circuit includes one or more interconnects the that are susceptible to dielectric breakdown selected. One selected adjusted increase via wire spacing with respect at least and of interconnects. Preferably, selecting analyzes signal patterns interconnects, estimates stress ratio based on state probability routed nets layout. An annotated is provided describes distances by which segment edges be shifted. Adjustments can include thinning shifting segments, rotation vias.

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