Template having alignment marks formed of contrast material
作者： Kosta S. Selinidis , Ian Matthew McMackin , Byung-Jin Choi , Ecron D. Thompson , Gerard M. Schmid
DOI:
关键词:
摘要: Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming having material are described.
google.com.br 参考文章(291)
Akio Ohkoshi, Toyohiro Ogino, Takuji Inoue, Toshikazu Yokota, Method of producing transmissive screens ,(1988)
Roger T. Bonnecaze, Carlton Grant Willson, Sidlgata V. Sreenivasan, Apparatus for imprint lithography using an electric field ,(2004)
Chen-Hua D. Yu, Method for forming dielectric ,(1994)
Stephen Chou, Lithographic method with bonded release layer for molding small patterns ,(2002)
John Melngailis, Mark A. Hartney, David C. Shaver, Positive resist pattern formation through focused ion beam exposure and surface barrier silylation ,(1992)
Mario J. Meissl, Anshuman Cherala, Sidlgata V. Sreenivasan, Pawan K Nimmakayala, Byung-Jin Choi, Apparatus to vary dimensions of a substrate during nano-scale manufacturing ,(2005)
Dennis Richard McKean, Brad Lee Jackson, Ping-Wei Chang, Eun Kyoung Row, Jennifer Lu, Bulent Nihat Kurdi, Planarization in an encapsulation process for thin film surfaces ,(2002)
Babak Mokaberi, Philip D. Schumaker, Tom H. Rafferty, Spatial phase feature location ,(2008)
William D. Stephens, Mold release composition with polybutadiene and method of coating a mold core ,(1995)
William Nixon Taylor, Gerald McNutt, Kenneth Smyth, Stefan Wolff, Jun Zhao, Plasma chamber with fixed RF matching ,(1996)