High contrast alignment marks through multiple stage imprinting
作者： Kosta S. Selinidis , Dwayne L. LaBrake , Joseph Michael Imhof
DOI:
关键词: High contrast 、 Materials science 、 Lithography 、 Nanotechnology 、 Fabrication 、 Imprinting (psychology) 、 Multiple stages
摘要: Two-stage imprinting techniques capable of protecting fine patterned features an imprint lithography template are herein described. In particular, such may be used during fabrication recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with etched the template.
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