SrTiO3 thin films by mocvd for 1 gbit DRAM application
作者： Pierre-Yves Lesaicherre , Hiromu Yamaguchi , Yoichi Miyasaka , Hirohito Watanabe , Haruhiko Ono
DOI: 10.1080/10584589508012313
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摘要: Abstract Three important aspects of the preparation SrTiO3 thin films by MOCVD are discussed in detail view application these as capacitor dielectric Gbit-scale DRAMs: CVD reactions Sr(DPM)2-Ti(i-OC3H7)4-O2 system, step coverage and relations between microstructure electrical properties. The effect substrate temperature on Sr Ti deposition rates was first investigated for thermal ECR films. SrO TiO2 above 550°C were found to be controlled surface reaction gas transport, respectively, whereas both transport at 450 600°C. influence regimes SrO, then assessed. prepared 600°C exhibited best coverage, indicating that a relation exists good coverage. film compositio...
sci-hub.se 参考文章(19)
Gota Kano, Shin-ichi Katsu, Masamichi Azuma, Shinichiro Hayashi, Akihiro Matsuda, Koji Arita, Atsuo Inoue, Yasuhiro Shimada, Carlos A. Paz de Araujo, Yasuhiro Uemoto, Tatsuo Otsuki, Larry D. Mcmillan, Eiji Fujii, Toru Nasu, Yoshihisa Nagano, Application of Ferroelectric Thin Films to Si Devices (Special Issue on Quarter Micron Si Device and Process Technologies) IEICE Transactions on Electronics. ,vol. 77, pp. 392- 398 ,(1994)
Tetsuro Makita, Yoshikazu Ohno, Tsuyoshi Horikawa, Noboru Mikami, Kazunao Sato, Hiromi Ito, (Ba_<0.75>Sr_<0.25>)TiO_3 Films for 256 Mbit DRAM (Special Issue on Quarter Micron Si Device and Process Technologies) IEICE Transactions on Electronics. ,vol. 77, pp. 385- 391 ,(1994)
Tsuyoshi Horikawa, Noboru Mikami, Tetsuro Makita, Junji Tanimura, Masayuki Kataoka, Kazunao Sato, Masahiro Nunoshita, Dielectric Properties of (Ba, Sr)TiO3Thin Films Deposited by RF Sputtering Japanese Journal of Applied Physics. ,vol. 32, pp. 4126- 4130 ,(1993) , 10.1143/JJAP.32.4126
Hiromu Yamaguchi, Pierre-Yves Lesaicherre, Toshiyuki Sakuma, Yoichi Miyasaka, Akihiko Ishitani, Masaji Yoshida, Structural and Electrical Characterization of SrTiO3Thin Films Prepared by Metal Organic Chemical Vapor Deposition Japanese Journal of Applied Physics. ,vol. 32, pp. 4069- 4073 ,(1993) , 10.1143/JJAP.32.4069
W. A. Feil, B. W. Wessels, L. M. Tonge, T. J. Marks, Organometallic chemical vapor deposition of strontium titanate Journal of Applied Physics. ,vol. 67, pp. 3858- 3861 ,(1990) , 10.1063/1.345034
Koichi Takemura, Toshiyuki Sakuma, Yoichi Miyasaka, High dielectric constant (Ba,Sr)TiO3 thin films prepared on RuO2/sapphire Applied Physics Letters. ,vol. 64, pp. 2967- 2969 ,(1994) , 10.1063/1.111396
Masahiko Hiratani, Yoshinobu Tarutani, Tokuumi Fukazawa, Masakuni Okamoto, Kazumasa Takagi, Growth of SrTiO3 thin films by pulsed-laser deposition Thin Solid Films. ,vol. 227, pp. 100- 104 ,(1993) , 10.1016/0040-6090(93)90192-R
Hiromu Yamaguchi, Shogo Matsubara, Yoichi Miyasaka, Reactive Coevaporation Synthesis and Characterization of SrTiO3Thin Films Japanese Journal of Applied Physics. ,vol. 30, pp. 2197- 2199 ,(1991) , 10.1143/JJAP.30.2197
L.A. Wills, W.A. Feil, B.W. Wessels, L.M. Tonge, T.J. Marks, Growth studies of ferroelectric oxide layers prepared by organometallic chemical vapor deposition Journal of Crystal Growth. ,vol. 107, pp. 712- 715 ,(1991) , 10.1016/0022-0248(91)90547-I
M. N. Kamalasanan, N. Deepak Kumar, Subhas Chandra, Structural, optical, and dielectric properties of sol-gel derived SrTiO3 thin films Journal of Applied Physics. ,vol. 74, pp. 679- 686 ,(1993) , 10.1063/1.355230