作者: B. Heinemann , R. Barth , D. Bolze , J. Drews , G. G. Fischer
DOI: 10.1109/IEDM.2010.5703452
关键词:
摘要: A SiGe HBT technology featuring f T/f max/BV CEO= 300GHz/500GHz/1.6 V and a minimum CML ring oscillator gate delay of 2.0 ps is presented. The speed-improvement compared to our previous SiGe HBT generations originates from lateral device scaling, a reduced thermal budget, and changes of the emitter and base composition, of the salicide resistance as well as of the low-doped collector formation.