Purified Silicon Film Formation from Metallurgical-Grade Silicon by Hydrogen-Plasma-Induced Chemical Transport
作者： Hiromasa Ohmi , Takahiro Yamada , Hiroaki Kakiuchi , Kiyoshi Yasutake
关键词:
摘要: … to eliminate B2H6 from SiH4 gas. The pyrolysis filter is made of porous carbon material that is … of gas transmittance for SiH4 and B2H6 measured by the FT-IR absorption spectroscopy. …
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B. G. Gribov, K. V. Zinov'ev, Preparation of High-Purity Silicon for Solar Cells Inorganic Materials. ,vol. 39, pp. 653- 662 ,(2003) , 10.1023/A:1024553420534
J.C.S. Pires, J. Otubo, A.F.B. Braga, P.R. Mei, The purification of metallurgical grade silicon by electron beam melting Journal of Materials Processing Technology. ,vol. 169, pp. 16- 20 ,(2005) , 10.1016/J.JMATPROTEC.2004.03.035
Takuya Matsui, Riza Muhida, Tomohiro Kawamura, Toshihiko Toyama, Hiroaki Okamoto, Tsutomu Yamazaki, Shinya Honda, Hideyuki Takakura, Yoshihiro Hamakawa, Microstructural dependence of electron and hole transport in low-temperature-grown polycrystalline-silicon thin-film solar cells Applied Physics Letters. ,vol. 81, pp. 4751- 4753 ,(2002) , 10.1063/1.1527979
Philip W. Morrison, John R. Haigis, In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon Journal of Vacuum Science and Technology. ,vol. 11, pp. 490- 502 ,(1993) , 10.1116/1.578761
Hiromasa Ohmi, Hiroaki Kakiuchi, Yoshinori Hamaoka, Kiyoshi Yasutake, Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma Journal of Applied Physics. ,vol. 102, pp. 023302- ,(2007) , 10.1063/1.2753675
N. Yuge, H. Baba, Y. Sakaguchi, K. Nishikawa, H. Terashima, F. Aratani, Purification of metallurgical silicon up to solar grade Solar Energy Materials and Solar Cells. ,vol. 34, pp. 243- 250 ,(1994) , 10.1016/0927-0248(94)90046-9
S. Vepřek, V. Mareček, The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport Solid-state Electronics. ,vol. 11, pp. 683- 684 ,(1968) , 10.1016/0038-1101(68)90071-3
Takehiko Sato, Tsutomu Sugiura, Michio Ohtsubo, Shigeru Matsuno, Makoto Konagai, Texture Etching of Si with Atomic Hydrogen Generated by Hot Wire Method through SiO2 Masks for Solar Cell Applications Japanese Journal of Applied Physics. ,vol. 46, pp. 6796- 6800 ,(2007) , 10.1143/JJAP.46.6796
Hiromasa Ohmi, Kazuya Kishimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake, Impacts of noble gas dilution on Si film structure prepared by atmospheric-pressure plasma enhanced chemical transport Journal of Physics D. ,vol. 41, pp. 195208- ,(2008) , 10.1088/0022-3727/41/19/195208
P CABARROCAS, S Kumar, B Drévillon, Insitustudy of the thermal decomposition of B2H6by combining spectroscopic ellipsometry and Kelvin probe measurements Journal of Applied Physics. ,vol. 66, pp. 3286- 3292 ,(1989) , 10.1063/1.344122