Solid-state image sensing device containing electron multiplication function

作者: Yasuhito Yoneta , Masaharu Muramatsu , Kentaro Maeta , Shin-Ichiro Takagi , Hisanori Suzuki

DOI:

关键词:

摘要: Disclosed is a solid-state image sensing device containing an electron multiplication function. In cross section perpendicular to transfer direction in register (EM), insulation layer (2) has center area, the thickness of which larger than thicknesses opposed side portions layer; and pair overflow drains (1N) are formed boundaries between area N-type semiconductor (1C), each drain extends (EM). Overflow gate electrodes (G) extend from thin portion thick (2), provided ends electrode (8A, 8B) longitudinal thereof, function as shield for 8B).

参考文章(28)
Hirose Satoshi, CCD IMAGE SENSOR ,(1991)
Yasutaka Nakashiba, Solid-state image sensing device ,(2007)
Shirai Masaharu, Terada Kenji, Tsuchida Shuhei, Tsukada Yutaka, MANUFACTURE OF SEMICONDUCTOR DEVICE ,(1996)
Hakamata Kazuo, Kuranishi Hideaki, IMAGE PICKUP DEVICE ,(2003)
David James Burt, Raymond Thomas Bell, CCD imager with separate charge multiplication elements ,(2000)
Peter James Pool, Raymond Thomas Bell, Solid state imager arrangements ,(2003)