The dynamics of reactive ion sputtering of SnSb and InSn alloys in an ArO2 atmosphere

作者: E. Leja , A. Kołodziej , T. Pisarkiewicz , T. Stapiński

DOI: 10.1016/0040-6090(81)90699-4

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摘要: Abstract The mechanism of the reactive sputtering SnSb and InSn alloys in a atmosphere was investigated. oxygen content mixture composition target influence properties films.

参考文章(3)
Tetsuya Abe, Toshiro Yamashina, The deposition rate of metallic thin films in the reactive sputtering process Thin Solid Films. ,vol. 30, pp. 19- 27 ,(1975) , 10.1016/0040-6090(75)90300-4
E. Leja, T. Pisarkiewicz, A. Kołodziej, Electrical properties of non-stoichiometric tin oxide films obtained by the d.c. reactive sputtering method Thin Solid Films. ,vol. 67, pp. 45- 48 ,(1980) , 10.1016/0040-6090(80)90285-0
E. Leja, J. Korecki, K. Krop, K. Toll, Phase composition of SnOx thin films obtained by reactive d.c. sputtering Thin Solid Films. ,vol. 59, pp. 147- 155 ,(1979) , 10.1016/0040-6090(79)90288-8