Photo-excited processes related to semiconductor technology
作者： Mitsugu Hanabusa
DOI: 10.1016/0040-6090(92)90912-U
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摘要: Abstract In thin film technology today, new techniques based on photo-excited processes attract a great deal of attention. this article the present status field is reviewed from point view semiconductor technology. The topics chosen here include fundamentals processes, in particular photo-induced surface phenomena and reactions, laser microprocessing (direct writing pattern transfer), photodeposition films, doping etching, cleaning. importance improving light sources pointed out, connection recent researches synchrotron radiation are described. addition, special source gases should be developed for use processes.
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