Microstructural characteristics of layered metastable phases

作者: T.C. Chou , T.G. Nieh

DOI: 10.1016/0956-716X(92)90055-J

关键词:

摘要:

参考文章(30)
Robert Beyers, Robert Sinclair, Metastable phase formation in titanium‐silicon thin films Journal of Applied Physics. ,vol. 57, pp. 5240- 5245 ,(1985) , 10.1063/1.335263
T.C. Chou, D. Adamson, J. Mardinly, T.G. Nieh, Microstructural evolution and properties of nanocrystalline alumina made by reactive sputtering deposition Thin Solid Films. ,vol. 205, pp. 131- 139 ,(1991) , 10.1016/0040-6090(91)90294-8
P. Pirouz, U. Dahmen, K.H. Westmacott, R. Chaim, The martensitic transformation in silicon—III. comparison with other work Acta Metallurgica et Materialia. ,vol. 38, pp. 329- 336 ,(1990) , 10.1016/0956-7151(90)90063-M
H. Föll, C. B. Carter, Direct TEM determination of intrinsic and extrinsic stacking fault energies of silicon Philosophical Magazine. ,vol. 40, pp. 497- 510 ,(1979) , 10.1080/01418617908234855
U. Dahmen, C.J. Hetherington, P. Pirouz, K.H. Westmacott, The formation of hexagonal silicon at twin intersections Scripta Metallurgica. ,vol. 23, pp. 269- 272 ,(1989) , 10.1016/0036-9748(89)90424-9
L. A. Clevenger, C. V. Thompson, K. N. Tu, Explosive silicidation in nickel/amorphous‐silicon multilayer thin films Journal of Applied Physics. ,vol. 67, pp. 2894- 2898 ,(1990) , 10.1063/1.345429
P. Pirouz, R. Chaim, U. Dahmen, K.H. Westmacott, The martensitic transformation in silicon—I experimental observations Acta Metallurgica et Materialia. ,vol. 38, pp. 313- 322 ,(1990) , 10.1016/0956-7151(90)90061-K