Sub-100 nm lithography using ultrashort wavelength of surface plasmons

摘要: The development of a nanolithography technique utilizing ultrashort wavelength surface plasmons (SPs) is presented in this article. mask consists silver thin film perforated with two-dimensional hole arrays exhibiting superior confinement due to SPs equal 14 that the illuminating light (365 nm). This short can confine field on an area much smaller compared excitation wavelength, leading higher resolution lithography than conventional photolithography methods. Finite-difference time-domain simulations show significantly enhanced electric and tight near-field profile obtained from plasmonic masks, where features as small 30 nm be resolved. Furthermore, experiments have been performed demonstration sub-100 spatial resolution.