Localized surface plasmon nanolithography with ultrahigh resolution.
作者： Xingzhan Wei , Xiangang Luo , Xiaochun Dong , Chunlei Du
DOI: 10.1364/OE.15.014177
关键词: Surface plasmon resonance 、 Ultraviolet light 、 Surface plasmon 、 Materials science 、 Nanolithography 、 Local field 、 Localized surface plasmon 、 Optics 、 Grating 、 Surface plasmon polariton
摘要: A localized surface plasmon nanolithography (LSPN) technique is proposed and demonstrated to produce patterns with a sub-20nm line width. High transmission efficiency realized by adjusting the period of grating. The well-regulated grating structures in metallic mask are employed excite polaritons (SPPs) on illuminated side. SPP waves propagate toward tip along taper surfaces which cause most energy accumulation at give rise high local field enhancements near-field region around tip. amplitude electric intensity quite large width can be confined within sub-20nm, same time, contrast spatial resolution greatly enhanced, facilitate efficiently simple ultraviolet light sources.
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