Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons.

摘要: A nanolithography technique based on the interference of surface plasmons (SPs) is proposed and demonstrated to modulate localized exposure energy. The SP waves participating in are excited by two distinct structures, namely, grating nanotaper. Constructive or destructive interference, which ultimately causes an enhanced reduced modulation energy, can be obtained merely adjusting distance taper. Detailedly speaking, energy modulated consecutively with a constant periodicity, range extremely wide, for instance, maximum nearly 3 orders magnitude larger than minimum our FDTD simulation results. Moreover, since electric field at taper tip, leads photoresist, sensitive it suggests potential way produce patterns different depths critical widths one chip via beforehand programming reasonably controlling corresponding SPs.