Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold

摘要: We have recently shown that patterns with 30 nm line width and micrometer scale periodicity could be steadily fabricated by employing localized surface plasmons lithography based on a soft mold [Opt. Lett. 35, 13 (2009)]. In this paper, the dependence of resolution (pattern periodicity), critical dimension, electric field intensity geometrical parameters mold, such as ridge width, periodicity, depth, slope, been systematically studied analyzed. The relevant simulation results finite-difference time-domain demonstrate dimension exhibits perfect stabilization value would especially large, when depth is in range from 100 to 270 slope angle below 35 degrees. Importantly, optimal can reach 17 nm, respectively, reasonably designing corresponding which indicates method particularly suitable for obtaining high density extremely promising bio-sensing photonic crystals application. (C) 2011 Optical Society America