Influence of Ti, Fe, and Cu metal submicron-particles on diamond CVD on Si substrates
作者： R. Shima , Y. Chakk , A. Hoffman
DOI: 10.1016/S0008-6223(00)00019-1
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摘要: Abstract It is known that CVD diamond nucleation densities on virgin substrates may be enhanced as a result of surface abrasion with powder. Diamond debris embedded in the substrate (by ultrasonic agitation) serve seeds for subsequent growth. With aim to investigate influence nano-sized metal particles formation by chemical vapour deposition (CVD), Ti, Fe, and Cu powders were added abrasive slurry. To quantitatively compare efficiency these metals enhancement, effect equal amounts should compared. By varying weight slurry, we managed control atomic concentration surface. The various concentrations (as measured Auger electron spectroscopy) then correlated deposited particle (established scanning microscope), relative catalytic activity towards has been established. was found 1% activities display following order Ti:Fe:Cu:(no metal)≈20:9:2:1.
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