Liquid coating system
作者： Kiyohisa Tateyama , Yoshio Kimura , Yuji Yoshimoto , Tetsuro Nakahara , Yuji Matsuyama
DOI:
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摘要: A liquid coating system according to the present invention comprises, a supply source, nozzle having an inlet communicating with source and substantially linear discharge portion, pressure feed unit for feeding under from by means of compressed gas, spin chuck fixedly supporting semiconductor wafer, up-and-down cylinder causing portion closely face wafer on chuck, rotating mechanism chuck. The includes reservoir, in which supplied is collected, large number small passages reservoir. further comprises air operation valve disposed communication passage between used reduce fed
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