The gamma irradiation responses of yttrium oxide capacitors and first assessment usage in radiation sensors

作者: Saleh Abubakar , Senol Kaya , Huseyin Karacali , Ercan Yilmaz

DOI: 10.1016/J.SNA.2017.02.022

关键词:

摘要: Abstract Co-60 gamma irradiation responses of the Y 2 O 3 MOS capacitors were investigated, and initial assessment dielectrics used in radiation sensors was discussed. We analyzed effects applied from flat-band mid-gap voltage shifts, also capacitance–voltage measurements obtained before after irradiation. It has been observed that measured capacitance is almost constant with basic modification flat band shifts toward more positive voltages due to negative charge accumulation, thanks trap centers capacitors. The reason trapping devices structure may be attributed ionized Yttrium atoms cluster oxygen vacancies occurred by Also, a linear dose relation observed, sensitivity found 10.8 ± 0.43 mV/Gy for calculated five different capacitors, which sensitive than conventional SiO dielectric layers. higher probably high trapped efficiency dielectrics. On other hand, generated oxide traps densities increase while interface state density trend varies This behavior states passivation layer semiconductor. accumulation order 10 –10 11 cm −2 given range. did not cause any significant device degradation through its operation. Consequently, does significantly affect Especially, system performance sensitivity, promising future gate material candidate

参考文章(40)
Ralph K. Cavin III, Daniel J.C. Herr, Victor V. Zhirnov, Semiconductor Research Needs in the Nanoscale Physical Sciences: A Semiconductor Research Corporation Working Paper Journal of Nanoparticle Research. ,vol. 2, pp. 213- 235 ,(2000) , 10.1023/A:1010007723640
S. Kaya, E. Yilmaz, A. Kahraman, H. Karacali, Frequency dependent gamma-ray irradiation response of Sm2O3 MOS capacitors Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 358, pp. 188- 193 ,(2015) , 10.1016/J.NIMB.2015.06.037
Paul V. Dressendorfer, T. P. Ma, Ionizing radiation effects in MOS devices and circuits New York, NY (USA); John Wiley and Sons Inc.. ,(1989)
Dennis D. Buss, Physics of Deep Submicron CMOS VLSI AIP Conference Proceedings. ,vol. 772, pp. 1591- 1591 ,(2005) , 10.1063/1.1994727
Yung-Hsien Wu, Min-Lin Wu, Rong-Jhe Lyu, Jia-Rong Wu, Lun-Lun Chen, Chia-Chun Lin, Crystalline ZrO2-gated Ge metal-oxide-semiconductor capacitors fabricated on Si substrate with Y2O3 as passivation layer Applied Physics Letters. ,vol. 98, pp. 203502- ,(2011) , 10.1063/1.3590923
M Chandra Sekhar, N Nanda Kumar Reddy, B Venkata Rao, G Mohan Rao, S Uthanna, None, Influence of sputter power on structural and electrical properties of TiO2 films for Al/TiO2/Si gate capacitors Surface and Interface Analysis. ,vol. 46, pp. 465- 471 ,(2014) , 10.1002/SIA.5538
A. M. Mahajan, A. G. Khairnar, B. J. Thibeault, Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon Semiconductors. ,vol. 48, pp. 497- 500 ,(2014) , 10.1134/S1063782614040204
F. Belgin Ergin, Raşit Turan, Sergiu T. Shishiyanu, Ercan Yilmaz, Effect of γ-radiation on HfO2 based MOS capacitor Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 268, pp. 1482- 1485 ,(2010) , 10.1016/J.NIMB.2010.01.027
Stuart J. Pearce, Greg J. Parker, Martin D. B. Charlton, James S. Wilkinson, Structural and optical properties of yttrium oxide thin films for planar waveguiding applications Journal of Vacuum Science and Technology. ,vol. 28, pp. 1388- 1392 ,(2010) , 10.1116/1.3503621
Tedi Kurniawan, Kuan Yew Cheong, Khairunisak Abdul Razak, Zainovia Lockman, Nuruddin Ahmad, Oxidation of sputtered Zr thin film on Si substrate Journal of Materials Science: Materials in Electronics. ,vol. 22, pp. 143- 150 ,(2011) , 10.1007/S10854-010-0103-1