Chemical vapor deposited borides of the form (Ti,Zr)B2 and (Ta,Ti)B2
作者： E. Randich
DOI: 10.1016/0040-6090(79)90034-8
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摘要: Abstract ZrB 2 , (Ti,Zr)B (Ta,Ti)B and Ta B have been synthesized in the temperature range of 1073–1373 K using chemical vapor deposition procedures. The materials were produced as fully dense coatings on graphite hydrogen reduction BCl 3 respective metal chloride(s). It was not possible to deposit pure TaB but a phase identified formed when both TiCl 4 TaCl 5 present reactant gas mixture. Hardness measurements various boride phases gave following VHN 25 values (kg mm -2 ): 2200; about 3700 (maximum); B, 2430; (Ta 0.75 Ti 0.25 )B 3100.
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